The Effect of Al<sub>2</sub>O<sub>3</sub> Nanoparticles on Hexagonal Boron Nitride Films Resulting from High-Temperature Annealing

The Effect of Al<sub>2</sub>O<sub>3</sub> Nanoparticles on Hexagonal Boron Nitride Films Resulting from High-Temperature Annealing

A simple two-step approach was proposed to obtain hBN thin films with high crystalline quality, meaning that the films were initially prepared by using an RF magnetron sputtering technique and subsequently followed by a post-annealing process at a high temperature. In the case of introducing Al<s...

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Bibliographic Details
Main Authors: Qiang Li, Kangkang Liu, Ransheng Chen, Wannian Fang, Zhihao Zhang, Youwei Chen, Haifeng Liu, Ziyan Lin, Yuhuai Liu, Tao Wang
Format: Article
Language:English
Published: MDPI AG 2025-03-01
Series:Nanomaterials
Subjects:
boron nitride
magnetron sputtering
post-annealing
Online Access:https://www.mdpi.com/2079-4991/15/7/484
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