Performance of a Double Gate Nanoscale MOSFET (DG-MOSFET) Based on Novel Channel Materials

In this paper, we have studied a double gate nanoscale MOSFET for various channel materials using simulation approach. The device metrics considered at the nanometer scale are subthreshold swing (SS), drain induced barrier lowering (DIBL), on and off current, carrier injection velocity (vinj), etc....

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Bibliographic Details
Main Authors: Rakesh Prasher, Devi Dass, Rakesh Vaid
Format: Article
Language:English
Published: Sumy State University 2013-03-01
Series:Журнал нано- та електронної фізики
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Online Access:http://jnep.sumdu.edu.ua/download/numbers/2013/1/articles/jnep_2013_V5_01017.pdf
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