Effect of CO2 addition to Ar on gas cluster ion beam sputtering of a Si wafer: An in-situ XPS study
Many recent studies showed mixing CO2 with the Ar gas source improves the secondary ionization yield of an Ar gas cluster ion beam (GCIB) with enhanced depth resolution. However, the impact of CO2 addition on the surface chemical structure remains unclear. In the present work, we studied the effect...
Saved in:
| Main Authors: | , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2025-06-01
|
| Series: | Applied Surface Science Advances |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2666523925000583 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|