First-Principles Study of Topological Nodal Line Semimetal I229-Ge<sub>48</sub> via Cluster Assembly

First-Principles Study of Topological Nodal Line Semimetal I229-Ge<sub>48</sub> via Cluster Assembly

Group IV element-based topological semimetals (TSMs) are pivotal for next-generation quantum devices due to their ultra-high carrier mobility and low-energy consumption. However, germanium (Ge)-based TSMs remain underexplored despite their compatibility with existing semiconductor technologies. Here...

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Bibliographic Details
Main Authors: Liwei Liu, Xin Wang, Nan Wang, Yaru Chen, Shumin Wang, Caizhi Hua, Tielei Song, Zhifeng Liu, Xin Cui
Format: Article
Language:English
Published: MDPI AG 2025-07-01
Series:Nanomaterials
Subjects:
germanium
mechanical anisotropy
nodal line semimetals
optical properties
Online Access:https://www.mdpi.com/2079-4991/15/14/1109
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