Effect of Pulsed Photon Processing in Nitrogen Ambient on Optical and Electrophysical Characteristics of Silicon Dioxide Layers of Its Boundaries with Silicon

The influence of pulsed photon processing in a nitrogen medium with an incoherent radiation flux from quartz halogen lamps directed to the non-working side of the wafer, providing heating to 1150 °C in about 7 s, on the optical properties of 17.7 nm thick silicon dioxide layers formed by pyrogenic o...

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Bibliographic Details
Main Authors: N. S. Kovalchuk, V. A. Pilipenko, Ja. A. Solovjov
Format: Article
Language:Russian
Published: Educational institution «Belarusian State University of Informatics and Radioelectronics» 2025-07-01
Series:Doklady Belorusskogo gosudarstvennogo universiteta informatiki i radioèlektroniki
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Online Access:https://doklady.bsuir.by/jour/article/view/4154
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