Remarkable thermal stability of Si-doped γ-Fe2O3 thin films
The thermal stability of Si-doped γ-Fe2O3 thin films was investigated. These films were prepared by using a two-step process. First, Si-doped Fe3O4 thin films were prepared on water-cooled glass substrates by radio frequency sputtering, followed by heat treatment in air for up to 256 days. X-ray dif...
Saved in:
| Main Author: | |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
AIP Publishing LLC
2025-06-01
|
| Series: | AIP Advances |
| Online Access: | http://dx.doi.org/10.1063/5.0272743 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|