Buried power rail to suppress substrate leakage in complementary field effect transistor (CFET)

In the pursuit of minimizing the track height in standard cell, a design innovation incorporating complementary field-effect transistors (CFETs) and Buried Power Rail (BPR) technology has been introduced. As the track height in conventional standard cells scales down to 3-track standard cell, the di...

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Bibliographic Details
Main Authors: Eungyo Jang, Jaehyuk Lim, Changhwan Shin
Format: Article
Language:English
Published: IOP Publishing 2024-01-01
Series:Nano Express
Subjects:
Online Access:https://doi.org/10.1088/2632-959X/ada0ce
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