Monitoring the chemical and structural changes during progressive aqueous alteration of silica thin films deposited by CVD process : accurate thickness loss rates measurements
Abstract This study investigates the alteration behaviour in aqueous KOH solution (pH 4) of CVD amorphous silica thin films exhibiting different network qualities. The hydrolysis of the networks was elucidated through ERDA (Elastic Recoil Detection Analysis) hydrogen depth profiles acquired througho...
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| Format: | Article |
| Language: | English |
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Nature Portfolio
2025-05-01
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| Series: | npj Materials Degradation |
| Online Access: | https://doi.org/10.1038/s41529-025-00610-w |
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| author | Farah Inoubli Babacar Diallo Konstantina Christina Topka Raphael Laloo Emmanuel Veron Vincent Sarou-Kanian Brigitte Caussat Thierry Sauvage Viviane Turq Nadia Pellerin |
| author_facet | Farah Inoubli Babacar Diallo Konstantina Christina Topka Raphael Laloo Emmanuel Veron Vincent Sarou-Kanian Brigitte Caussat Thierry Sauvage Viviane Turq Nadia Pellerin |
| author_sort | Farah Inoubli |
| collection | DOAJ |
| description | Abstract This study investigates the alteration behaviour in aqueous KOH solution (pH 4) of CVD amorphous silica thin films exhibiting different network qualities. The hydrolysis of the networks was elucidated through ERDA (Elastic Recoil Detection Analysis) hydrogen depth profiles acquired throughout the alteration process. Thickness loss rates were successfully calculated showing remarkably low initial rates ranging from 2.5 to 4.8 nm/day, directly correlated with the initial network quality. A minimal rate as low as 0.5 nm/day, comparable to bulk silica performances, was recorded indicating the limited hydration and hydrolysis mechanisms leading to the release of H4SiO4. These phenomena are occurring with a cyclic hydrolysis–dissolution process. These findings represent the first available dataset on dissolution rates of CVD-deposited silica films. This comprehensive investigation has facilitated the accurate correlation of CVD deposition temperature and, therefore, the network quality of silica films to the chemical and mechanical response to aqueous alteration. |
| format | Article |
| id | doaj-art-da248e08da864a3e97cc2ee2a3e18d2e |
| institution | OA Journals |
| issn | 2397-2106 |
| language | English |
| publishDate | 2025-05-01 |
| publisher | Nature Portfolio |
| record_format | Article |
| series | npj Materials Degradation |
| spelling | doaj-art-da248e08da864a3e97cc2ee2a3e18d2e2025-08-20T02:03:38ZengNature Portfolionpj Materials Degradation2397-21062025-05-019111310.1038/s41529-025-00610-wMonitoring the chemical and structural changes during progressive aqueous alteration of silica thin films deposited by CVD process : accurate thickness loss rates measurementsFarah Inoubli0Babacar Diallo1Konstantina Christina Topka2Raphael Laloo3Emmanuel Veron4Vincent Sarou-Kanian5Brigitte Caussat6Thierry Sauvage7Viviane Turq8Nadia Pellerin9Université d’OrléansUniversité d’OrléansAir Liquide Laboratories, Innovation Campus TokyoCentre Interuniversitaire de Recherche et d’Ingénierie des Matériaux (CIRIMAT)Université d’OrléansUniversité d’OrléansINPUniversité d’OrléansCentre Interuniversitaire de Recherche et d’Ingénierie des Matériaux (CIRIMAT)Université d’OrléansAbstract This study investigates the alteration behaviour in aqueous KOH solution (pH 4) of CVD amorphous silica thin films exhibiting different network qualities. The hydrolysis of the networks was elucidated through ERDA (Elastic Recoil Detection Analysis) hydrogen depth profiles acquired throughout the alteration process. Thickness loss rates were successfully calculated showing remarkably low initial rates ranging from 2.5 to 4.8 nm/day, directly correlated with the initial network quality. A minimal rate as low as 0.5 nm/day, comparable to bulk silica performances, was recorded indicating the limited hydration and hydrolysis mechanisms leading to the release of H4SiO4. These phenomena are occurring with a cyclic hydrolysis–dissolution process. These findings represent the first available dataset on dissolution rates of CVD-deposited silica films. This comprehensive investigation has facilitated the accurate correlation of CVD deposition temperature and, therefore, the network quality of silica films to the chemical and mechanical response to aqueous alteration.https://doi.org/10.1038/s41529-025-00610-w |
| spellingShingle | Farah Inoubli Babacar Diallo Konstantina Christina Topka Raphael Laloo Emmanuel Veron Vincent Sarou-Kanian Brigitte Caussat Thierry Sauvage Viviane Turq Nadia Pellerin Monitoring the chemical and structural changes during progressive aqueous alteration of silica thin films deposited by CVD process : accurate thickness loss rates measurements npj Materials Degradation |
| title | Monitoring the chemical and structural changes during progressive aqueous alteration of silica thin films deposited by CVD process : accurate thickness loss rates measurements |
| title_full | Monitoring the chemical and structural changes during progressive aqueous alteration of silica thin films deposited by CVD process : accurate thickness loss rates measurements |
| title_fullStr | Monitoring the chemical and structural changes during progressive aqueous alteration of silica thin films deposited by CVD process : accurate thickness loss rates measurements |
| title_full_unstemmed | Monitoring the chemical and structural changes during progressive aqueous alteration of silica thin films deposited by CVD process : accurate thickness loss rates measurements |
| title_short | Monitoring the chemical and structural changes during progressive aqueous alteration of silica thin films deposited by CVD process : accurate thickness loss rates measurements |
| title_sort | monitoring the chemical and structural changes during progressive aqueous alteration of silica thin films deposited by cvd process accurate thickness loss rates measurements |
| url | https://doi.org/10.1038/s41529-025-00610-w |
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