Monitoring the chemical and structural changes during progressive aqueous alteration of silica thin films deposited by CVD process : accurate thickness loss rates measurements

Monitoring the chemical and structural changes during progressive aqueous alteration of silica thin films deposited by CVD process : accurate thickness loss rates measurements

Abstract This study investigates the alteration behaviour in aqueous KOH solution (pH 4) of CVD amorphous silica thin films exhibiting different network qualities. The hydrolysis of the networks was elucidated through ERDA (Elastic Recoil Detection Analysis) hydrogen depth profiles acquired througho...

Full description

Saved in:
Bibliographic Details
Main Authors: Farah Inoubli, Babacar Diallo, Konstantina Christina Topka, Raphael Laloo, Emmanuel Veron, Vincent Sarou-Kanian, Brigitte Caussat, Thierry Sauvage, Viviane Turq, Nadia Pellerin
Format: Article
Language:English
Published: Nature Portfolio 2025-05-01
Series:npj Materials Degradation
Online Access:https://doi.org/10.1038/s41529-025-00610-w
Tags: Add Tag
No Tags, Be the first to tag this record!

Internet

https://doi.org/10.1038/s41529-025-00610-w

Similar Items