Inoubli, F., Diallo, B., Topka, K. C., Laloo, R., Veron, E., Sarou-Kanian, V., . . . Pellerin, N. Monitoring the chemical and structural changes during progressive aqueous alteration of silica thin films deposited by CVD process: Accurate thickness loss rates measurements. Nature Portfolio.
Chicago Style (17th ed.) CitationInoubli, Farah, et al. Monitoring the Chemical and Structural Changes During Progressive Aqueous Alteration of Silica Thin Films Deposited by CVD Process: Accurate Thickness Loss Rates Measurements. Nature Portfolio.
MLA (9th ed.) CitationInoubli, Farah, et al. Monitoring the Chemical and Structural Changes During Progressive Aqueous Alteration of Silica Thin Films Deposited by CVD Process: Accurate Thickness Loss Rates Measurements. Nature Portfolio.