Direct chemical vapor deposition of CoO on Ni-foam for supercapacitor electrode applications
Low-pressure chemical vapor deposition was used to grow cobalt oxide (CoO) directly on nickel foam using a Cobalt Chloride (CoCl2·6H2O) precursor. The resultant coating was evaluated with scanning electron microscopy, X-ray diffraction, and X-ray photoelectron spectroscopy, which revealed a disorder...
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| Main Authors: | , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Elsevier
2025-07-01
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| Series: | Next Materials |
| Subjects: | |
| Online Access: | http://www.sciencedirect.com/science/article/pii/S2949822825000887 |
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