Quantitative micrometer-scale heat dissipation analysis using pixel-level emissivity correction-based operando IR thermography

Infrared (IR) thermography is widely used for non-invasive, real-time thermal analysis of semiconductor devices. However, quantitative measurements remain challenging for heterogeneously integrated devices composed of various materials with varying IR emissivities (ranging from 0 to 1). Here, we pre...

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Main Authors: Seongjin Kim, Jae Yong Song
Format: Article
Language:English
Published: Elsevier 2025-10-01
Series:Case Studies in Thermal Engineering
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2214157X25011049
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author Seongjin Kim
Jae Yong Song
author_facet Seongjin Kim
Jae Yong Song
author_sort Seongjin Kim
collection DOAJ
description Infrared (IR) thermography is widely used for non-invasive, real-time thermal analysis of semiconductor devices. However, quantitative measurements remain challenging for heterogeneously integrated devices composed of various materials with varying IR emissivities (ranging from 0 to 1). Here, we present a practical and reliable pixel-level emissivity correction method, where the emissivity of heterogeneous materials (ranging from 0.21 to 0.97) is quantitatively calibrated by measuring radiance at known temperatures using an IR camera, in conjunction with high-emissivity reference segments. Using this operando IR thermography, we experimentally analyze the heat dissipation behavior of an NPU device consisting of 4 mm-scale cores, each comprising six submillimeter-scale sub-cores, with a spatial resolution of 2.4 μm. The results indicate that heat originating from hotspots on the NPU cores is transferred toward the edge of the device and that heat dissipation reaches a saturation over time. Despite thermal resistance between the sub-cores, heat is continuously dissipated without abrupt temperature changes. The proposed operando IR thermography is expected to have broad applicability in microscale thermal management of heterogeneously integrated devices.
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spelling doaj-art-d495d6655485480caf2fcd45564435192025-08-20T03:05:39ZengElsevierCase Studies in Thermal Engineering2214-157X2025-10-017410684410.1016/j.csite.2025.106844Quantitative micrometer-scale heat dissipation analysis using pixel-level emissivity correction-based operando IR thermographySeongjin Kim0Jae Yong Song1Department of Materials Science and Engineering, Pohang University of Science and Technology, Pohang, 37673, Republic of KoreaDepartment of Materials Science and Engineering, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea; Department of Semiconductor Engineering, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea; Graduate School of Semiconductor Technology, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea; Corresponding author. Department of Semiconductor Engineering, Pohang University of Science and Technology, Pohang, 37673, Republic of Korea.Infrared (IR) thermography is widely used for non-invasive, real-time thermal analysis of semiconductor devices. However, quantitative measurements remain challenging for heterogeneously integrated devices composed of various materials with varying IR emissivities (ranging from 0 to 1). Here, we present a practical and reliable pixel-level emissivity correction method, where the emissivity of heterogeneous materials (ranging from 0.21 to 0.97) is quantitatively calibrated by measuring radiance at known temperatures using an IR camera, in conjunction with high-emissivity reference segments. Using this operando IR thermography, we experimentally analyze the heat dissipation behavior of an NPU device consisting of 4 mm-scale cores, each comprising six submillimeter-scale sub-cores, with a spatial resolution of 2.4 μm. The results indicate that heat originating from hotspots on the NPU cores is transferred toward the edge of the device and that heat dissipation reaches a saturation over time. Despite thermal resistance between the sub-cores, heat is continuously dissipated without abrupt temperature changes. The proposed operando IR thermography is expected to have broad applicability in microscale thermal management of heterogeneously integrated devices.http://www.sciencedirect.com/science/article/pii/S2214157X25011049Infrared thermographyEmissivity correctionOperando measurementsHotspotHeat dissipation
spellingShingle Seongjin Kim
Jae Yong Song
Quantitative micrometer-scale heat dissipation analysis using pixel-level emissivity correction-based operando IR thermography
Case Studies in Thermal Engineering
Infrared thermography
Emissivity correction
Operando measurements
Hotspot
Heat dissipation
title Quantitative micrometer-scale heat dissipation analysis using pixel-level emissivity correction-based operando IR thermography
title_full Quantitative micrometer-scale heat dissipation analysis using pixel-level emissivity correction-based operando IR thermography
title_fullStr Quantitative micrometer-scale heat dissipation analysis using pixel-level emissivity correction-based operando IR thermography
title_full_unstemmed Quantitative micrometer-scale heat dissipation analysis using pixel-level emissivity correction-based operando IR thermography
title_short Quantitative micrometer-scale heat dissipation analysis using pixel-level emissivity correction-based operando IR thermography
title_sort quantitative micrometer scale heat dissipation analysis using pixel level emissivity correction based operando ir thermography
topic Infrared thermography
Emissivity correction
Operando measurements
Hotspot
Heat dissipation
url http://www.sciencedirect.com/science/article/pii/S2214157X25011049
work_keys_str_mv AT seongjinkim quantitativemicrometerscaleheatdissipationanalysisusingpixellevelemissivitycorrectionbasedoperandoirthermography
AT jaeyongsong quantitativemicrometerscaleheatdissipationanalysisusingpixellevelemissivitycorrectionbasedoperandoirthermography