Nanoscale Strain Mapping in SIMOX 3-D Sculpted Silicon Waveguides Using Tip-Enhanced Raman Spectroscopy

Strain in silicon plays a significant role in exploring electro-optical material, boosting transistor performance, tuning birefringence of optical silicon waveguides, and so on. In this paper, we measured, for the first time, the nanoscale strain in the SIMOX 3-D sculpted silicon waveguides using ti...

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Main Authors: Huashun Wen, Yuefeng Ji, Bahram Jalali
Format: Article
Language:English
Published: IEEE 2016-01-01
Series:IEEE Photonics Journal
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Online Access:https://ieeexplore.ieee.org/document/7574350/
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author Huashun Wen
Yuefeng Ji
Bahram Jalali
author_facet Huashun Wen
Yuefeng Ji
Bahram Jalali
author_sort Huashun Wen
collection DOAJ
description Strain in silicon plays a significant role in exploring electro-optical material, boosting transistor performance, tuning birefringence of optical silicon waveguides, and so on. In this paper, we measured, for the first time, the nanoscale strain in the SIMOX 3-D sculpted silicon waveguides using tip-enhanced Raman spectroscopy (TERS). A model, which relates the observed Raman peak shifts to the localized stresses for our TERS experiments, was presented. The tip-induced electric-field enhancements, tip-induced depolarization of incident light, and oblique incidence geometry of the TERS system were included in the model. Both polarizations of incident light and Raman scattered light are selected appropriately with the guidance of the model for obtaining enough electric-field enhancements and accurately calculate the stresses. A 2-D stress map inside the silicon waveguide with spatial resolution of about 20 nm was obtained, and corresponding strains were calculated based on Hooke's law. We observed that the stresses are compressive, and the strains show inhomogeneity. The origins of strain and the strain-induced second-order optical susceptibility inside the SIMOX 3-D sculpted buried silicon waveguides are discussed and analyzed. The mapping of 2-D nanoscale strain and the analysis of second-order optical susceptibility in this work suggest that the SIMOX 3-D sculpted strained silicon might be a potential metamaterial for electro-optical modulation and optical signal processing. Moreover, the presented TERS model could be a valuable tool for probing strain in strained silicon devices.
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spelling doaj-art-d19bb0af93ee4780b7422267cf97c4d52025-08-20T03:30:56ZengIEEEIEEE Photonics Journal1943-06552016-01-018511210.1109/JPHOT.2016.26123607574350Nanoscale Strain Mapping in SIMOX 3-D Sculpted Silicon Waveguides Using Tip-Enhanced Raman SpectroscopyHuashun Wen0Yuefeng Ji1Bahram Jalali2State Key Laboratory of Information Photonics and Optical Communications, School of Information and Communication Engineering, Beijing University of Posts and Telecommunications, Beijing, ChinaState Key Laboratory of Information Photonics and Optical Communications, School of Information and Communication Engineering, Beijing University of Posts and Telecommunications, Beijing, ChinaDepartment of Electrical Engineering, University of California, Los Angeles, CA, USAStrain in silicon plays a significant role in exploring electro-optical material, boosting transistor performance, tuning birefringence of optical silicon waveguides, and so on. In this paper, we measured, for the first time, the nanoscale strain in the SIMOX 3-D sculpted silicon waveguides using tip-enhanced Raman spectroscopy (TERS). A model, which relates the observed Raman peak shifts to the localized stresses for our TERS experiments, was presented. The tip-induced electric-field enhancements, tip-induced depolarization of incident light, and oblique incidence geometry of the TERS system were included in the model. Both polarizations of incident light and Raman scattered light are selected appropriately with the guidance of the model for obtaining enough electric-field enhancements and accurately calculate the stresses. A 2-D stress map inside the silicon waveguide with spatial resolution of about 20 nm was obtained, and corresponding strains were calculated based on Hooke's law. We observed that the stresses are compressive, and the strains show inhomogeneity. The origins of strain and the strain-induced second-order optical susceptibility inside the SIMOX 3-D sculpted buried silicon waveguides are discussed and analyzed. The mapping of 2-D nanoscale strain and the analysis of second-order optical susceptibility in this work suggest that the SIMOX 3-D sculpted strained silicon might be a potential metamaterial for electro-optical modulation and optical signal processing. Moreover, the presented TERS model could be a valuable tool for probing strain in strained silicon devices.https://ieeexplore.ieee.org/document/7574350/Electro-optical materialsengineered photonic nanostructuresoptical and other propertiesRaman spectroscopySIMOX 3-D sculptingstrained silicon
spellingShingle Huashun Wen
Yuefeng Ji
Bahram Jalali
Nanoscale Strain Mapping in SIMOX 3-D Sculpted Silicon Waveguides Using Tip-Enhanced Raman Spectroscopy
IEEE Photonics Journal
Electro-optical materials
engineered photonic nanostructures
optical and other properties
Raman spectroscopy
SIMOX 3-D sculpting
strained silicon
title Nanoscale Strain Mapping in SIMOX 3-D Sculpted Silicon Waveguides Using Tip-Enhanced Raman Spectroscopy
title_full Nanoscale Strain Mapping in SIMOX 3-D Sculpted Silicon Waveguides Using Tip-Enhanced Raman Spectroscopy
title_fullStr Nanoscale Strain Mapping in SIMOX 3-D Sculpted Silicon Waveguides Using Tip-Enhanced Raman Spectroscopy
title_full_unstemmed Nanoscale Strain Mapping in SIMOX 3-D Sculpted Silicon Waveguides Using Tip-Enhanced Raman Spectroscopy
title_short Nanoscale Strain Mapping in SIMOX 3-D Sculpted Silicon Waveguides Using Tip-Enhanced Raman Spectroscopy
title_sort nanoscale strain mapping in simox 3 d sculpted silicon waveguides using tip enhanced raman spectroscopy
topic Electro-optical materials
engineered photonic nanostructures
optical and other properties
Raman spectroscopy
SIMOX 3-D sculpting
strained silicon
url https://ieeexplore.ieee.org/document/7574350/
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AT yuefengji nanoscalestrainmappinginsimox3dsculptedsiliconwaveguidesusingtipenhancedramanspectroscopy
AT bahramjalali nanoscalestrainmappinginsimox3dsculptedsiliconwaveguidesusingtipenhancedramanspectroscopy