Direct Observation of Dry Etch‐Induced Selectivity Tailoring of Alkylate Inhibition Layer Using DMATMS Vapor
Abstract Area‐selective deposition is a key method for enhancing precision in nanofabrication, particularly for next‐generation semiconductor devices. (N,N‐dimethylamino)trimethylsilane (DMATMS) is attracting increasing attention for its ability to form a selective inhibition layer on technologicall...
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| Main Authors: | , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley-VCH
2025-05-01
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| Series: | Advanced Materials Interfaces |
| Subjects: | |
| Online Access: | https://doi.org/10.1002/admi.202400843 |
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