Chemical mechanical polishing as an alternative surface treatment technique for corrosion prevention of carbon steel in an acidic medium

Chemical mechanical polishing as an alternative surface treatment technique for corrosion prevention of carbon steel in an acidic medium

Abstract Chemical mechanical polishing (CMP) has been a standard technique in semiconductor manufacturing for achieving smooth surfaces. CMP utilizes a synergistic interplay of chemical and mechanical interactions to achieve the desired removal rates, selectivity, and ultimately planarity with diffe...

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Bibliographic Details
Main Authors: Mohamed Ahmed, Buthainah Ali Al-Timimi, Maha Al-Ali, Ghassan H. Abdullah, Safa Khalaf Atiyaha, Ahmed Yaseen Ali Aljanabi, Maizirwan Mel
Format: Article
Language:English
Published: Nature Portfolio 2025-04-01
Series:Scientific Reports
Subjects:
Chemical mechanical polishing
Immersion test
Electrochemical corrosion test
Hydrogen peroxide oxidizer
Silica-based slurry
Surface roughness
Online Access:https://doi.org/10.1038/s41598-025-98210-w
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https://doi.org/10.1038/s41598-025-98210-w

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