Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits
A technique for realizing electrically erasable photonics devices using micro-heaters for localized annealing of lattice defects in silicon is presented. The lattice defects have previously been introduced by ion implantation in order to cause a refractive index change. This technique can be used to...
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| Format: | Article |
| Language: | English |
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IEEE
2020-01-01
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| Series: | IEEE Photonics Journal |
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| Online Access: | https://ieeexplore.ieee.org/document/9210769/ |
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| author | Xingshi Yu Xia Chen Milan M. Milosevic Xingzhao Yan Shinichi Saito Graham T. Reed |
| author_facet | Xingshi Yu Xia Chen Milan M. Milosevic Xingzhao Yan Shinichi Saito Graham T. Reed |
| author_sort | Xingshi Yu |
| collection | DOAJ |
| description | A technique for realizing electrically erasable photonics devices using micro-heaters for localized annealing of lattice defects in silicon is presented. The lattice defects have previously been introduced by ion implantation in order to cause a refractive index change. This technique can be used to fabricate electrically erasable on-chip directional couplers (DCs) and Mach-Zehnder Interferometer (MZI) switches. These devices can be used for wafer scale testing of photonics circuits, allowing testing of individual optical components in a complex photonic integrated circuit, or components for programmable optical circuits, whilst inducing negligible additional optical loss when erased electrically. In this paper, we report the designs and experimental results of fully, rapidly annealing of these devices. |
| format | Article |
| id | doaj-art-ce50a892d09e487fa5e14d37937c5494 |
| institution | DOAJ |
| issn | 1943-0655 |
| language | English |
| publishDate | 2020-01-01 |
| publisher | IEEE |
| record_format | Article |
| series | IEEE Photonics Journal |
| spelling | doaj-art-ce50a892d09e487fa5e14d37937c54942025-08-20T03:14:53ZengIEEEIEEE Photonics Journal1943-06552020-01-011251810.1109/JPHOT.2020.30277999210769Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated CircuitsXingshi Yu0https://orcid.org/0000-0002-3315-0342Xia Chen1https://orcid.org/0000-0002-0994-5401Milan M. Milosevic2https://orcid.org/0000-0001-8060-3722Xingzhao Yan3https://orcid.org/0000-0002-2466-3015Shinichi Saito4Graham T. Reed5Zepler Institute for Photonics and Nanoelectronics, Optoelectronics Research Centre, University of Southampton, Southampton, U.K.Zepler Institute for Photonics and Nanoelectronics, Optoelectronics Research Centre, University of Southampton, Southampton, U.K.Zepler Institute for Photonics and Nanoelectronics, Optoelectronics Research Centre, University of Southampton, Southampton, U.K.Zepler Institute for Photonics and Nanoelectronics, Optoelectronics Research Centre, University of Southampton, Southampton, U.K.Department of Electronics and Computer Science, Sustainable Electronic Technologies, University of Southampton, Southampton, U.K.Zepler Institute for Photonics and Nanoelectronics, Optoelectronics Research Centre, University of Southampton, Southampton, U.K.A technique for realizing electrically erasable photonics devices using micro-heaters for localized annealing of lattice defects in silicon is presented. The lattice defects have previously been introduced by ion implantation in order to cause a refractive index change. This technique can be used to fabricate electrically erasable on-chip directional couplers (DCs) and Mach-Zehnder Interferometer (MZI) switches. These devices can be used for wafer scale testing of photonics circuits, allowing testing of individual optical components in a complex photonic integrated circuit, or components for programmable optical circuits, whilst inducing negligible additional optical loss when erased electrically. In this paper, we report the designs and experimental results of fully, rapidly annealing of these devices.https://ieeexplore.ieee.org/document/9210769/Ion-implantationElectrically erasableDirectional couplersMach-Zehnder InterferometerWafer scale testing |
| spellingShingle | Xingshi Yu Xia Chen Milan M. Milosevic Xingzhao Yan Shinichi Saito Graham T. Reed Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits IEEE Photonics Journal Ion-implantation Electrically erasable Directional couplers Mach-Zehnder Interferometer Wafer scale testing |
| title | Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits |
| title_full | Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits |
| title_fullStr | Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits |
| title_full_unstemmed | Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits |
| title_short | Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits |
| title_sort | electrically erasable optical i x002f o for wafer scale testing of silicon photonic integrated circuits |
| topic | Ion-implantation Electrically erasable Directional couplers Mach-Zehnder Interferometer Wafer scale testing |
| url | https://ieeexplore.ieee.org/document/9210769/ |
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