Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits

A technique for realizing electrically erasable photonics devices using micro-heaters for localized annealing of lattice defects in silicon is presented. The lattice defects have previously been introduced by ion implantation in order to cause a refractive index change. This technique can be used to...

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Main Authors: Xingshi Yu, Xia Chen, Milan M. Milosevic, Xingzhao Yan, Shinichi Saito, Graham T. Reed
Format: Article
Language:English
Published: IEEE 2020-01-01
Series:IEEE Photonics Journal
Subjects:
Online Access:https://ieeexplore.ieee.org/document/9210769/
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author Xingshi Yu
Xia Chen
Milan M. Milosevic
Xingzhao Yan
Shinichi Saito
Graham T. Reed
author_facet Xingshi Yu
Xia Chen
Milan M. Milosevic
Xingzhao Yan
Shinichi Saito
Graham T. Reed
author_sort Xingshi Yu
collection DOAJ
description A technique for realizing electrically erasable photonics devices using micro-heaters for localized annealing of lattice defects in silicon is presented. The lattice defects have previously been introduced by ion implantation in order to cause a refractive index change. This technique can be used to fabricate electrically erasable on-chip directional couplers (DCs) and Mach-Zehnder Interferometer (MZI) switches. These devices can be used for wafer scale testing of photonics circuits, allowing testing of individual optical components in a complex photonic integrated circuit, or components for programmable optical circuits, whilst inducing negligible additional optical loss when erased electrically. In this paper, we report the designs and experimental results of fully, rapidly annealing of these devices.
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issn 1943-0655
language English
publishDate 2020-01-01
publisher IEEE
record_format Article
series IEEE Photonics Journal
spelling doaj-art-ce50a892d09e487fa5e14d37937c54942025-08-20T03:14:53ZengIEEEIEEE Photonics Journal1943-06552020-01-011251810.1109/JPHOT.2020.30277999210769Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated CircuitsXingshi Yu0https://orcid.org/0000-0002-3315-0342Xia Chen1https://orcid.org/0000-0002-0994-5401Milan M. Milosevic2https://orcid.org/0000-0001-8060-3722Xingzhao Yan3https://orcid.org/0000-0002-2466-3015Shinichi Saito4Graham T. Reed5Zepler Institute for Photonics and Nanoelectronics, Optoelectronics Research Centre, University of Southampton, Southampton, U.K.Zepler Institute for Photonics and Nanoelectronics, Optoelectronics Research Centre, University of Southampton, Southampton, U.K.Zepler Institute for Photonics and Nanoelectronics, Optoelectronics Research Centre, University of Southampton, Southampton, U.K.Zepler Institute for Photonics and Nanoelectronics, Optoelectronics Research Centre, University of Southampton, Southampton, U.K.Department of Electronics and Computer Science, Sustainable Electronic Technologies, University of Southampton, Southampton, U.K.Zepler Institute for Photonics and Nanoelectronics, Optoelectronics Research Centre, University of Southampton, Southampton, U.K.A technique for realizing electrically erasable photonics devices using micro-heaters for localized annealing of lattice defects in silicon is presented. The lattice defects have previously been introduced by ion implantation in order to cause a refractive index change. This technique can be used to fabricate electrically erasable on-chip directional couplers (DCs) and Mach-Zehnder Interferometer (MZI) switches. These devices can be used for wafer scale testing of photonics circuits, allowing testing of individual optical components in a complex photonic integrated circuit, or components for programmable optical circuits, whilst inducing negligible additional optical loss when erased electrically. In this paper, we report the designs and experimental results of fully, rapidly annealing of these devices.https://ieeexplore.ieee.org/document/9210769/Ion-implantationElectrically erasableDirectional couplersMach-Zehnder InterferometerWafer scale testing
spellingShingle Xingshi Yu
Xia Chen
Milan M. Milosevic
Xingzhao Yan
Shinichi Saito
Graham T. Reed
Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits
IEEE Photonics Journal
Ion-implantation
Electrically erasable
Directional couplers
Mach-Zehnder Interferometer
Wafer scale testing
title Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits
title_full Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits
title_fullStr Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits
title_full_unstemmed Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits
title_short Electrically Erasable Optical I/O for Wafer Scale Testing of Silicon Photonic Integrated Circuits
title_sort electrically erasable optical i x002f o for wafer scale testing of silicon photonic integrated circuits
topic Ion-implantation
Electrically erasable
Directional couplers
Mach-Zehnder Interferometer
Wafer scale testing
url https://ieeexplore.ieee.org/document/9210769/
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AT xiachen electricallyerasableopticalix002foforwaferscaletestingofsiliconphotonicintegratedcircuits
AT milanmmilosevic electricallyerasableopticalix002foforwaferscaletestingofsiliconphotonicintegratedcircuits
AT xingzhaoyan electricallyerasableopticalix002foforwaferscaletestingofsiliconphotonicintegratedcircuits
AT shinichisaito electricallyerasableopticalix002foforwaferscaletestingofsiliconphotonicintegratedcircuits
AT grahamtreed electricallyerasableopticalix002foforwaferscaletestingofsiliconphotonicintegratedcircuits