Scalable Fabrication of Highly Organized, Horizontally Aligned Sub‐5 nm Silicon Nanowires via Chemical Vapor Etching

Scalable Fabrication of Highly Organized, Horizontally Aligned Sub‐5 nm Silicon Nanowires via Chemical Vapor Etching

Herein, the scalable fabrication of hierarchical silicon structures featuring high‐density, horizontally super‐aligned sub‐5 nm silicon nanowires (SiNWs), is reported. These unprecedented, highly organized silicon architectures with tunable sizes and densities are fabricated using straightforward mi...

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Bibliographic Details
Main Authors: Juyeon Seo, Peiyun Feng, Jianlin Li, Sanghyun Hong, Sen Gao, Ji Young Byun, Yung Joon Jung
Format: Article
Language:English
Published: Wiley-VCH 2025-06-01
Series:Small Science
Subjects:
chemical vapor etchings
hierarchical structures
silicon nanowires
surface‐enhanced raman scatterings
Online Access:https://doi.org/10.1002/smsc.202400627
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https://doi.org/10.1002/smsc.202400627

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