25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography
Abstract One of the major challenges in the rapidly advancing field of nanophotonics is creating high-aspect-ratio nanostructures over large-area with consistent precision. Traditional techniques like photolithography and etching fall short, being limited to fabricating structures with a typical fea...
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| Language: | English |
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Nature Portfolio
2025-08-01
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| Series: | Nature Communications |
| Online Access: | https://doi.org/10.1038/s41467-025-62426-1 |
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| author | Zhi Chen Lijing Zhong Xiangyu Sun Yihui Fu Huilin He Huijiao Ji Yuying Wang Xiaofeng Liu Beibei Xu Zhemin Wu Chen Zou Zhijun Ma Jingyu Zhang Guoping Dong Giuseppe Barillaro Cheng-Wei Qiu Jianbei Qiu Jianrong Qiu |
| author_facet | Zhi Chen Lijing Zhong Xiangyu Sun Yihui Fu Huilin He Huijiao Ji Yuying Wang Xiaofeng Liu Beibei Xu Zhemin Wu Chen Zou Zhijun Ma Jingyu Zhang Guoping Dong Giuseppe Barillaro Cheng-Wei Qiu Jianbei Qiu Jianrong Qiu |
| author_sort | Zhi Chen |
| collection | DOAJ |
| description | Abstract One of the major challenges in the rapidly advancing field of nanophotonics is creating high-aspect-ratio nanostructures over large-area with consistent precision. Traditional techniques like photolithography and etching fall short, being limited to fabricating structures with a typical feature size of 100 nm and a maximum aspect ratio of 30:1. To break through these barriers, herein we introduce a strategy, called wet-chemical etching assisted aberration-enhanced single-pulsed femtosecond laser-supplemented nanolithography (WEALTH), for manufacturing large-area deep holey nanostructures. This strategy enables fabrication of nanostructures with diameters as small as 25 nm (exceeding 1/30 of Abbe’s diffraction limit), aspect ratios greater than 104:1, and large-area holey lattices spanning 10 mm2 with potential scalability up to several cm2. We have successfully harnessed this technique to develop cutting-edge applications, including immunoassay biosensing chips, large-area nanophotonic crystals, nanophotonic crystal microcavities, and chiral nanophotonic devices. Moreover, it is adaptable to a wide range of materials, including crystals, glasses, and silicon-based semiconductors. Our approach offers high flexibility in customizing large-area holey nanophotonic structures, paving the way for breakthrough advancements in 3D integrated optics. |
| format | Article |
| id | doaj-art-c9483ee913ae49a681fa597b7f9cabfd |
| institution | Kabale University |
| issn | 2041-1723 |
| language | English |
| publishDate | 2025-08-01 |
| publisher | Nature Portfolio |
| record_format | Article |
| series | Nature Communications |
| spelling | doaj-art-c9483ee913ae49a681fa597b7f9cabfd2025-08-20T03:42:55ZengNature PortfolioNature Communications2041-17232025-08-0116111210.1038/s41467-025-62426-125 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithographyZhi Chen0Lijing Zhong1Xiangyu Sun2Yihui Fu3Huilin He4Huijiao Ji5Yuying Wang6Xiaofeng Liu7Beibei Xu8Zhemin Wu9Chen Zou10Zhijun Ma11Jingyu Zhang12Guoping Dong13Giuseppe Barillaro14Cheng-Wei Qiu15Jianbei Qiu16Jianrong Qiu17College of Materials Science and Engineering, Key Laboratory of Advanced Materials of Yunnan Province, Kunming University of Science and TechnologyInstitute of Light+X Science and Technology, College of Information Science and Engineering, Ningbo UniversityState Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang UniversityWuhan National Laboratory for Optoelectronics, Huazhong University of Science and TechnologyPeng Cheng LaboratoryLaboratory of Molecular Pharmacology, Department of Pharmacology, School of Pharmacy, Southwest Medical UniversityState Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang UniversitySchool of Materials Science and Engineering, Zhejiang UniversityState Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang UniversitySchool of Materials Science and Engineering, Zhejiang UniversitySchool of Materials Science and Engineering, Zhejiang UniversityZhejiang LabWuhan National Laboratory for Optoelectronics, Huazhong University of Science and TechnologyState Key Laboratory of Luminescent Materials and Devices, School of Materials Science and Engineering, South China University of TechnologyDipartimento di Ingegneria dell’Informazione, Università di PisaDepartment of Electrical and Computer Engineering, National University of SingaporeCollege of Materials Science and Engineering, Key Laboratory of Advanced Materials of Yunnan Province, Kunming University of Science and TechnologyState Key Laboratory of Extreme Photonics and Instrumentation, College of Optical Science and Engineering, Zhejiang UniversityAbstract One of the major challenges in the rapidly advancing field of nanophotonics is creating high-aspect-ratio nanostructures over large-area with consistent precision. Traditional techniques like photolithography and etching fall short, being limited to fabricating structures with a typical feature size of 100 nm and a maximum aspect ratio of 30:1. To break through these barriers, herein we introduce a strategy, called wet-chemical etching assisted aberration-enhanced single-pulsed femtosecond laser-supplemented nanolithography (WEALTH), for manufacturing large-area deep holey nanostructures. This strategy enables fabrication of nanostructures with diameters as small as 25 nm (exceeding 1/30 of Abbe’s diffraction limit), aspect ratios greater than 104:1, and large-area holey lattices spanning 10 mm2 with potential scalability up to several cm2. We have successfully harnessed this technique to develop cutting-edge applications, including immunoassay biosensing chips, large-area nanophotonic crystals, nanophotonic crystal microcavities, and chiral nanophotonic devices. Moreover, it is adaptable to a wide range of materials, including crystals, glasses, and silicon-based semiconductors. Our approach offers high flexibility in customizing large-area holey nanophotonic structures, paving the way for breakthrough advancements in 3D integrated optics.https://doi.org/10.1038/s41467-025-62426-1 |
| spellingShingle | Zhi Chen Lijing Zhong Xiangyu Sun Yihui Fu Huilin He Huijiao Ji Yuying Wang Xiaofeng Liu Beibei Xu Zhemin Wu Chen Zou Zhijun Ma Jingyu Zhang Guoping Dong Giuseppe Barillaro Cheng-Wei Qiu Jianbei Qiu Jianrong Qiu 25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography Nature Communications |
| title | 25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography |
| title_full | 25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography |
| title_fullStr | 25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography |
| title_full_unstemmed | 25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography |
| title_short | 25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography |
| title_sort | 25 nm feature 104 aspect ratio 10 mm2 area single pulsed laser nanolithography |
| url | https://doi.org/10.1038/s41467-025-62426-1 |
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