25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography

25 nm-Feature, 104-aspect-ratio, 10 mm2-area single-pulsed laser nanolithography

Abstract One of the major challenges in the rapidly advancing field of nanophotonics is creating high-aspect-ratio nanostructures over large-area with consistent precision. Traditional techniques like photolithography and etching fall short, being limited to fabricating structures with a typical fea...

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Bibliographic Details
Main Authors: Zhi Chen, Lijing Zhong, Xiangyu Sun, Yihui Fu, Huilin He, Huijiao Ji, Yuying Wang, Xiaofeng Liu, Beibei Xu, Zhemin Wu, Chen Zou, Zhijun Ma, Jingyu Zhang, Guoping Dong, Giuseppe Barillaro, Cheng-Wei Qiu, Jianbei Qiu, Jianrong Qiu
Format: Article
Language:English
Published: Nature Portfolio 2025-08-01
Series:Nature Communications
Online Access:https://doi.org/10.1038/s41467-025-62426-1
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https://doi.org/10.1038/s41467-025-62426-1

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