Grain-boundary diffusion in Cu and Ni films with thin metal coating

Investigation results of the grain-boundary diffusion in Сu films with thin Ni coating and in Ni films with thin Cu coating by the low-temperature resistometric method are presented in this work. It is shown that during the coating deposition and thermal annealing the irreversible increase in the el...

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Bibliographic Details
Main Authors: T.P. Hovorun, S.I. Protsenko, V.A. Pchelintsev, A.M. Chornous
Format: Article
Language:English
Published: Sumy State University 2009-01-01
Series:Журнал нано- та електронної фізики
Subjects:
Online Access:http://jnep.sumdu.edu.ua/download/numbers/2009/4/articles/en/jnep_eng_2009_V1_N4_90-100.pdf
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