Stabilizing Schottky‐to‐Ohmic Switching in HfO2‐Based Ferroelectric Films via Electrode Design

Abstract The discovery of ferroelectric phases in HfO2‐based films has reignited interest in ferroelectrics and their application in resistive switching (RS) devices. This study investigates the pivotal role of electrodes in facilitating the Schottky‐to‐Ohmic transition (SOT) observed in devices con...

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Main Authors: Moritz L. Müller, Nives Strkalj, Maximilian T. Becker, Megan O. Hill, Ji Soo Kim, Dibya Phuyal, Simon M. Fairclough, Caterina Ducati, Judith L. MacManus‐Driscoll
Format: Article
Language:English
Published: Wiley 2025-02-01
Series:Advanced Science
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Online Access:https://doi.org/10.1002/advs.202409566
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author Moritz L. Müller
Nives Strkalj
Maximilian T. Becker
Megan O. Hill
Ji Soo Kim
Dibya Phuyal
Simon M. Fairclough
Caterina Ducati
Judith L. MacManus‐Driscoll
author_facet Moritz L. Müller
Nives Strkalj
Maximilian T. Becker
Megan O. Hill
Ji Soo Kim
Dibya Phuyal
Simon M. Fairclough
Caterina Ducati
Judith L. MacManus‐Driscoll
author_sort Moritz L. Müller
collection DOAJ
description Abstract The discovery of ferroelectric phases in HfO2‐based films has reignited interest in ferroelectrics and their application in resistive switching (RS) devices. This study investigates the pivotal role of electrodes in facilitating the Schottky‐to‐Ohmic transition (SOT) observed in devices consisting of ultrathin epitaxial ferroelectric Hf0.93Y0.07O2 (YHO) films deposited on La0.67Sr0.33MnO3‐buffered Nb‐doped SrTiO3 (NbSTO|LSMO) with Ti|Au top electrodes. These findings indicate combined filamentary RS and ferroelectric switching occurs in devices with designed electrodes, having an ON/OFF ratio of over 100 during about 105 cycles. Transport measurements of modified device stacks show no change in SOT when the ferroelectric YHO layer is replaced with an equivalent hafnia‐based layer, Hf0.5Zr0.5O2 (HZO). However, incomplete SOT is observed for variations in the top electrode thickness or material, as well as LSMO electrode thickness. This underscores the importance of employing oxygen‐reactive electrodes and a bottom electrode with reduced conductivity to stabilize SOT. These findings provide valuable insights for enhancing the performance of ferroelectric RS devices through integration with filamentary RS mechanism.
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spelling doaj-art-b85c7abaecca47bbad58ed19496262ff2025-08-20T03:49:36ZengWileyAdvanced Science2198-38442025-02-01128n/an/a10.1002/advs.202409566Stabilizing Schottky‐to‐Ohmic Switching in HfO2‐Based Ferroelectric Films via Electrode DesignMoritz L. Müller0Nives Strkalj1Maximilian T. Becker2Megan O. Hill3Ji Soo Kim4Dibya Phuyal5Simon M. Fairclough6Caterina Ducati7Judith L. MacManus‐Driscoll8Department of Materials Science and Metallurgy University of Cambridge CB3 0FS Cambridge UKDepartment of Materials Science and Metallurgy University of Cambridge CB3 0FS Cambridge UKDepartment of Materials Science and Metallurgy University of Cambridge CB3 0FS Cambridge UKDepartment of Materials Science and Metallurgy University of Cambridge CB3 0FS Cambridge UKDepartment of Materials Science and Metallurgy University of Cambridge CB3 0FS Cambridge UKDepartment of Materials Science and Metallurgy University of Cambridge CB3 0FS Cambridge UKDepartment of Materials Science and Metallurgy University of Cambridge CB3 0FS Cambridge UKDepartment of Materials Science and Metallurgy University of Cambridge CB3 0FS Cambridge UKDepartment of Materials Science and Metallurgy University of Cambridge CB3 0FS Cambridge UKAbstract The discovery of ferroelectric phases in HfO2‐based films has reignited interest in ferroelectrics and their application in resistive switching (RS) devices. This study investigates the pivotal role of electrodes in facilitating the Schottky‐to‐Ohmic transition (SOT) observed in devices consisting of ultrathin epitaxial ferroelectric Hf0.93Y0.07O2 (YHO) films deposited on La0.67Sr0.33MnO3‐buffered Nb‐doped SrTiO3 (NbSTO|LSMO) with Ti|Au top electrodes. These findings indicate combined filamentary RS and ferroelectric switching occurs in devices with designed electrodes, having an ON/OFF ratio of over 100 during about 105 cycles. Transport measurements of modified device stacks show no change in SOT when the ferroelectric YHO layer is replaced with an equivalent hafnia‐based layer, Hf0.5Zr0.5O2 (HZO). However, incomplete SOT is observed for variations in the top electrode thickness or material, as well as LSMO electrode thickness. This underscores the importance of employing oxygen‐reactive electrodes and a bottom electrode with reduced conductivity to stabilize SOT. These findings provide valuable insights for enhancing the performance of ferroelectric RS devices through integration with filamentary RS mechanism.https://doi.org/10.1002/advs.202409566electrochemistryferroelectricityhafniainterfacesresistive switching
spellingShingle Moritz L. Müller
Nives Strkalj
Maximilian T. Becker
Megan O. Hill
Ji Soo Kim
Dibya Phuyal
Simon M. Fairclough
Caterina Ducati
Judith L. MacManus‐Driscoll
Stabilizing Schottky‐to‐Ohmic Switching in HfO2‐Based Ferroelectric Films via Electrode Design
Advanced Science
electrochemistry
ferroelectricity
hafnia
interfaces
resistive switching
title Stabilizing Schottky‐to‐Ohmic Switching in HfO2‐Based Ferroelectric Films via Electrode Design
title_full Stabilizing Schottky‐to‐Ohmic Switching in HfO2‐Based Ferroelectric Films via Electrode Design
title_fullStr Stabilizing Schottky‐to‐Ohmic Switching in HfO2‐Based Ferroelectric Films via Electrode Design
title_full_unstemmed Stabilizing Schottky‐to‐Ohmic Switching in HfO2‐Based Ferroelectric Films via Electrode Design
title_short Stabilizing Schottky‐to‐Ohmic Switching in HfO2‐Based Ferroelectric Films via Electrode Design
title_sort stabilizing schottky to ohmic switching in hfo2 based ferroelectric films via electrode design
topic electrochemistry
ferroelectricity
hafnia
interfaces
resistive switching
url https://doi.org/10.1002/advs.202409566
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