Frequency trimming of superconducting qubits using RF-biased ICP annealing

Frequency trimming of superconducting qubits using RF-biased ICP annealing

We propose a novel method for post-fabrication frequency trimming of superconducting qubits via RF-biased inductively coupled plasma (ICP) annealing. Junction resistance systematically increases with RF bias power, achieving a maximum increase of approximately 40% under O _2 plasma and up to 180% un...

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Bibliographic Details
Main Authors: Zhi-Long Jia, Lei Du, Hao-Ran Tao, Yong Chen, Hui Yang, Chi Zhang, Guo-Liang Xu, Long Shen, Wang-Sheng Xu, Nian-Ci Wang, Peng Duan, Guo-Ping Guo
Format: Article
Language:English
Published: IOP Publishing 2025-01-01
Series:Applied Physics Express
Subjects:
superconducting qubits
anneal
quantum computing
Online Access:https://doi.org/10.35848/1882-0786/addd5b
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Summary:We propose a novel method for post-fabrication frequency trimming of superconducting qubits via RF-biased inductively coupled plasma (ICP) annealing. Junction resistance systematically increases with RF bias power, achieving a maximum increase of approximately 40% under O _2 plasma and up to 180% under Ar plasma conditions. Specifically, oxygen-based ICP annealing notably improves qubit coherence, extending both relaxation ( T _1 ) and coherence ( T _2 ) times. Transmission Electron Microscopy (TEM) analysis indicates that the observed increase in junction resistance corresponds to structural changes and barrier thickening. Our results demonstrate that RF-biased ICP annealing provides a highly effective and controllable technique to tune qubit frequencies, representing a promising pathway toward improved coherence and scalability in superconducting quantum processors.
ISSN:1882-0786

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