APA (7th ed.) Citation

Lee, S., Jeong, J., Park, J., Lee, S., Lee, J., Ahn, Y., . . . Baek, R. Patterned Multi-Wall Nanosheet FETs for Sustainable Scaling: Zero Gate Extension With Minimal Gate Cut Width. IEEE.

Chicago Style (17th ed.) Citation

Lee, Sanguk, Jinsu Jeong, Jongseo Park, Seunghwan Lee, Junjong Lee, Yonghwan Ahn, Minchan Kim, and Rock-Hyun Baek. Patterned Multi-Wall Nanosheet FETs for Sustainable Scaling: Zero Gate Extension With Minimal Gate Cut Width. IEEE.

MLA (9th ed.) Citation

Lee, Sanguk, et al. Patterned Multi-Wall Nanosheet FETs for Sustainable Scaling: Zero Gate Extension With Minimal Gate Cut Width. IEEE.