RESEARCH AND THE ANALYSIS OF CHANGE OF PARAMETERS IN THE CHANNEL OF AVERAGE HIGH-VOLTAGE BIPOLAR STATIC INDUCTION TRANSISTOR

When developing a technology of power device’s structure generation the breakdown voltage and the resistance of silicon substrate are constitutive parameters. Modern generation methods allow to create a structure based on fragile materials which behavior directly depends on the breakdown voltage and...

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Main Author: P. R. Zakharova
Format: Article
Language:Russian
Published: Dagestan State Technical University 2016-07-01
Series:Вестник Дагестанского государственного технического университета: Технические науки
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Online Access:https://vestnik.dgtu.ru/jour/article/view/120
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author P. R. Zakharova
author_facet P. R. Zakharova
author_sort P. R. Zakharova
collection DOAJ
description When developing a technology of power device’s structure generation the breakdown voltage and the resistance of silicon substrate are constitutive parameters. Modern generation methods allow to create a structure based on fragile materials which behavior directly depends on the breakdown voltage and the resistance of chosen materials in the depth of structure. In this paper the work on determination the crystal’s channel resistance dependence of its structural parameters for the average high-voltage BSIT is done.
format Article
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publishDate 2016-07-01
publisher Dagestan State Technical University
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series Вестник Дагестанского государственного технического университета: Технические науки
spelling doaj-art-b5b515385bf844aeab37099f198a2c542025-08-20T03:00:51ZrusDagestan State Technical UniversityВестник Дагестанского государственного технического университета: Технические науки2073-61852542-095X2016-07-01292152110.21822/2073-6185-2013-29-2-15-21119RESEARCH AND THE ANALYSIS OF CHANGE OF PARAMETERS IN THE CHANNEL OF AVERAGE HIGH-VOLTAGE BIPOLAR STATIC INDUCTION TRANSISTORP. R. Zakharova0Дагестанский государственный технический университетWhen developing a technology of power device’s structure generation the breakdown voltage and the resistance of silicon substrate are constitutive parameters. Modern generation methods allow to create a structure based on fragile materials which behavior directly depends on the breakdown voltage and the resistance of chosen materials in the depth of structure. In this paper the work on determination the crystal’s channel resistance dependence of its structural parameters for the average high-voltage BSIT is done.https://vestnik.dgtu.ru/jour/article/view/120breakdown voltagestructural resistancegeneration technologystructural parameterssilicon substrate
spellingShingle P. R. Zakharova
RESEARCH AND THE ANALYSIS OF CHANGE OF PARAMETERS IN THE CHANNEL OF AVERAGE HIGH-VOLTAGE BIPOLAR STATIC INDUCTION TRANSISTOR
Вестник Дагестанского государственного технического университета: Технические науки
breakdown voltage
structural resistance
generation technology
structural parameters
silicon substrate
title RESEARCH AND THE ANALYSIS OF CHANGE OF PARAMETERS IN THE CHANNEL OF AVERAGE HIGH-VOLTAGE BIPOLAR STATIC INDUCTION TRANSISTOR
title_full RESEARCH AND THE ANALYSIS OF CHANGE OF PARAMETERS IN THE CHANNEL OF AVERAGE HIGH-VOLTAGE BIPOLAR STATIC INDUCTION TRANSISTOR
title_fullStr RESEARCH AND THE ANALYSIS OF CHANGE OF PARAMETERS IN THE CHANNEL OF AVERAGE HIGH-VOLTAGE BIPOLAR STATIC INDUCTION TRANSISTOR
title_full_unstemmed RESEARCH AND THE ANALYSIS OF CHANGE OF PARAMETERS IN THE CHANNEL OF AVERAGE HIGH-VOLTAGE BIPOLAR STATIC INDUCTION TRANSISTOR
title_short RESEARCH AND THE ANALYSIS OF CHANGE OF PARAMETERS IN THE CHANNEL OF AVERAGE HIGH-VOLTAGE BIPOLAR STATIC INDUCTION TRANSISTOR
title_sort research and the analysis of change of parameters in the channel of average high voltage bipolar static induction transistor
topic breakdown voltage
structural resistance
generation technology
structural parameters
silicon substrate
url https://vestnik.dgtu.ru/jour/article/view/120
work_keys_str_mv AT przakharova researchandtheanalysisofchangeofparametersinthechannelofaveragehighvoltagebipolarstaticinductiontransistor