GAN-Based Super-Resolution in Linear R-SAM Imaging for Enhanced Non-Destructive Semiconductor Measurement
The precise identification and non-destructive measurement of structural features and defects in semiconductor wafers are essential for ensuring process integrity and sustaining high yield in advanced manufacturing environments. Unlike conventional measurement techniques, scanning acoustic microscop...
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| Main Authors: | , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2025-06-01
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| Series: | Applied Sciences |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2076-3417/15/12/6780 |
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