Effect of temperature and deposition power on microstructure and properties of magnetron sputtered thin AlN coatings

This paper demonstrates the influence of deposition parameters (temperature, power and time) and stoichiometric composition of thin aluminum nitride (AlN) coatings, the thickness of which varied from 320 to 1100[Formula: see text]nm deposited by DC reactive magnetron sputtering on their microstructu...

Full description

Saved in:
Bibliographic Details
Main Authors: Vasilina Lapitskaya, Andrey Nikolaev, Anastasiya Khabarava, Evgeniy Sadyrin, Sergei Aizikovich, Anaid Azoyan, Dmitry Kotov, Sergei Chizhik, Guangbin Yu, Weifu Sun
Format: Article
Language:English
Published: World Scientific Publishing 2025-08-01
Series:Journal of Advanced Dielectrics
Subjects:
Online Access:https://www.worldscientific.com/doi/10.1142/S2010135X25400041
Tags: Add Tag
No Tags, Be the first to tag this record!