Semiconductor Wafer Defect Recognition Based on Improved Coordinate Attention Mechanism
In the semiconductor wafer manufacturing process, it is necessary to inspect the electrical parameters and functions of the wafer to identify the defects in the chip manufacturing process. The inspection results are presented in the form of wafers; therefore, the accuracy of wafer defect recognition...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
IEEE
2025-01-01
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| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/10908396/ |
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