Pulsed laser deposition OF III-V semiconductor thin films: review

This review highlights the latest advancements in pulsed laser deposition of III-V semiconductor thin films on various substrates. The pulsed laser deposition method is shown to be highly effective and distinct from other thin film deposition techniques due to its discrete nature. Epitaxial growth o...

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Bibliographic Details
Main Author: O.V. Devitsky
Format: Article
Language:Russian
Published: Tver State University 2024-12-01
Series:Физико-химические аспекты изучения кластеров, наноструктур и наноматериалов
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Online Access:https://physchemaspects.ru/2024/doi-10-26456-pcascnn-2024-16-621/?lang=en
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