An Effective Method to Compensate for Testing Induced SBFET Degradation by Charging Deep-Level Interface Trap
In this paper, the threshold voltage (<inline-formula> <tex-math notation="LaTeX">$V_{\mathrm {th}}$ </tex-math></inline-formula>) of Schottky barrier field effect transistors (SBFETs) based on ultra-thin silicon on insulator (SOI) wafer shift induced by electrical...
Saved in:
| Main Authors: | Tiexin Zhang, Fanyu Liu, Lei Shu, Siyuan Chen, Yuchong Wang, Yuchen Wu, Jing Wan, Yong Xu, Shi Li, Yuyang Ding, Bo Li, Zhengsheng Han, Tianchun Ye |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
IEEE
2025-01-01
|
| Series: | IEEE Access |
| Subjects: | |
| Online Access: | https://ieeexplore.ieee.org/document/11015469/ |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Modeling of total ionizing dose (TID) effects on the nonuniform distribution of Si/SiO2 interface trap energy states in MOS devices
by: Ali Khoshnoud, et al.
Published: (2025-05-01) -
Overview of the Properties and Formation Process of Interface Traps in MOS and Linear Bipolar Devices
by: Yanru Ren, et al.
Published: (2025-04-01) -
Nonvolatile Organic Floating-Gate Memory Using N2200 as Charge-Trapping Layer
by: Wenting Zhang, et al.
Published: (2025-02-01) -
The Interface Separation Boundary Influence on the Metal-Semiconductor Barrier Transitions Parameters
by: V.S. Dmitriev
Published: (2017-02-01) -
Development of a Serogroup B Specific Footrot Vaccine with Montanide ISA 61 VG Adjuvant for Prophylactic and Therapeutic Use in Sheep
by: Arham Quraishi, et al.
Published: (2025-03-01)