Near-field terahertz time-domain spectroscopy for in-line electrical metrology of semiconductor integration processes for memory
Abstract Monitoring electrical properties in semiconductor integration processes is crucial in identifying electrical defects that determine the reliability and performance of metal oxide semiconductor field-effect transistors. A non-destructive in-line metrology technique using terahertz (THz) wave...
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| Main Authors: | , , , , , , , , , , , , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Nature Portfolio
2025-02-01
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| Series: | Communications Engineering |
| Online Access: | https://doi.org/10.1038/s44172-025-00356-y |
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