Mechanism of OH*-Modified 4H-SiC Surface with Scratches Based on ReaxFF MD Simulation
OH* generated through plasma catalysis offers several advantages, including a long survival time, high modification efficiency, and environmental friendliness. Consequently, a plasma-assisted polishing technology has rapidly developed. Previous studies exploring the interaction mechanism between OH*...
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| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
MDPI AG
2025-02-01
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| Series: | Micromachines |
| Subjects: | |
| Online Access: | https://www.mdpi.com/2072-666X/16/2/184 |
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