Influence of Surface Processing Si on the Electrical Properties of Heterostructures p-NiO/n-Si
Heterostructure p-NiO/n-Si was fabrication by reactive magnetron sputtering thin films nickel oxide on substrates with crystal n-Si.The influence of treatment Si substrate on electrical properties of heterostructures was shown. Studied their dark current-voltage characteristics at room temperature....
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| Main Authors: | , , |
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| Format: | Article |
| Language: | English |
| Published: |
Sumy State University
2017-06-01
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| Series: | Журнал нано- та електронної фізики |
| Subjects: | |
| Online Access: | http://jnep.sumdu.edu.ua:8080/download/numbers/2017/3/articles/jnep_V9_03024.pdf |
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