Competition between one- and two-photon processes in Ar irradiated by the Shanghai soft x-ray free electron laser

Competition between one- and two-photon processes in Ar irradiated by the Shanghai soft x-ray free electron laser

Shanghai Soft X-ray Free Electron Laser facility has entered user operation, delivering soft x-ray pulses in self-amplified spontaneous emission mode with an intensity of the peak fluence of ∼1.0×10^{−2}µJ/µm^{2} at a focus point. With these conditions, at a photon energy of 260 eV, we expect sequen...

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Main Authors: Ruichao Dong, Jie Yan, Jinze Feng, Mingjie Zhang, Yikang Zhang, Yuliang Guo, Ahai Chen, Zhenjie Shen, Yuneng Shen, Zhen Wang, Kaiqing Zhang, Xuan Li, Zheng Qi, Zhangfeng Gao, Zenggong Jiang, Jiaming Jiang, Bin Li, Chao Feng, Bo Liu, Huaidong Jiang, Zhi Liu, Yajiang Hao, Kiyoshi Ueda, Cheng Gao, Xincheng Wang, Yuhai Jiang
Format: Article
Language:English
Published: American Physical Society 2025-08-01
Series:Physical Review Research
Online Access:http://doi.org/10.1103/j4rx-55m2
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http://doi.org/10.1103/j4rx-55m2

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