High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications
The growth of superconducting tantalum nitride (TaN) thin films on magnesium oxide (MgO) substrates has been studied using pulsed laser deposition (PLD). This research investigates the influence of varying deposition parameters, including substrate temperature and ambient gas composition, on the str...
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Beilstein-Institut
2025-05-01
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| Series: | Beilstein Journal of Nanotechnology |
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| Online Access: | https://doi.org/10.3762/bjnano.16.53 |
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| author | Michelle Cedillo Rosillo Oscar Contreras López Jesús Antonio Díaz Agustín Conde Gallardo Harvi A. Castillo Cuero |
| author_facet | Michelle Cedillo Rosillo Oscar Contreras López Jesús Antonio Díaz Agustín Conde Gallardo Harvi A. Castillo Cuero |
| author_sort | Michelle Cedillo Rosillo |
| collection | DOAJ |
| description | The growth of superconducting tantalum nitride (TaN) thin films on magnesium oxide (MgO) substrates has been studied using pulsed laser deposition (PLD). This research investigates the influence of varying deposition parameters, including substrate temperature and ambient gas composition, on the structural, morphological, and superconducting properties of the films. X-ray photoelectron spectroscopy, X-ray diffraction, atomic force microscopy, and transmission electron microscopy analyses revealed that the TaN films exhibit excellent crystallinity and smooth surface morphology, when deposited at optimal temperatures of 750 and 850 °C. The films exhibit superconducting transition temperatures (Tc) ranging from 5.0 to 6.3 K, depending on the stoichiometry and deposition conditions. Resistance–temperature curves further confirm the high quality of the films, as evidenced by their low residual resistivity ratios. These findings demonstrate that PLD is a suitable technique for producing high-quality TaN superconducting films. |
| format | Article |
| id | doaj-art-a0a90d5aa5ca4deaac0bfee83bc017fe |
| institution | DOAJ |
| issn | 2190-4286 |
| language | English |
| publishDate | 2025-05-01 |
| publisher | Beilstein-Institut |
| record_format | Article |
| series | Beilstein Journal of Nanotechnology |
| spelling | doaj-art-a0a90d5aa5ca4deaac0bfee83bc017fe2025-08-20T03:19:24ZengBeilstein-InstitutBeilstein Journal of Nanotechnology2190-42862025-05-0116169069910.3762/bjnano.16.532190-4286-16-53High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applicationsMichelle Cedillo Rosillo0Oscar Contreras López1Jesús Antonio Díaz2Agustín Conde Gallardo3Harvi A. Castillo Cuero4Centro de Nanociencias y Nanotecnología, Universidad Nacional Autónoma de México (UNAM) km. 107 Carretera Tijuana-Ensenada, Ensenada, Baja California 22800, México Centro de Nanociencias y Nanotecnología, Universidad Nacional Autónoma de México (UNAM) km. 107 Carretera Tijuana-Ensenada, Ensenada, Baja California 22800, México Centro de Nanociencias y Nanotecnología, Universidad Nacional Autónoma de México (UNAM) km. 107 Carretera Tijuana-Ensenada, Ensenada, Baja California 22800, México Departamento de Física, Centro de Investigación y de Estudios Avanzados del Instituto Politécnico Nacional (CINVESTAV-IPN), Apdo. Postal 14-740, México D.F. 07360, México Centro de Nanociencias y Nanotecnología, Universidad Nacional Autónoma de México (UNAM) km. 107 Carretera Tijuana-Ensenada, Ensenada, Baja California 22800, México The growth of superconducting tantalum nitride (TaN) thin films on magnesium oxide (MgO) substrates has been studied using pulsed laser deposition (PLD). This research investigates the influence of varying deposition parameters, including substrate temperature and ambient gas composition, on the structural, morphological, and superconducting properties of the films. X-ray photoelectron spectroscopy, X-ray diffraction, atomic force microscopy, and transmission electron microscopy analyses revealed that the TaN films exhibit excellent crystallinity and smooth surface morphology, when deposited at optimal temperatures of 750 and 850 °C. The films exhibit superconducting transition temperatures (Tc) ranging from 5.0 to 6.3 K, depending on the stoichiometry and deposition conditions. Resistance–temperature curves further confirm the high quality of the films, as evidenced by their low residual resistivity ratios. These findings demonstrate that PLD is a suitable technique for producing high-quality TaN superconducting films.https://doi.org/10.3762/bjnano.16.53epitaxial growthsquidstructural evolutionsuperconductivitytan thin films |
| spellingShingle | Michelle Cedillo Rosillo Oscar Contreras López Jesús Antonio Díaz Agustín Conde Gallardo Harvi A. Castillo Cuero High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications Beilstein Journal of Nanotechnology epitaxial growth squid structural evolution superconductivity tan thin films |
| title | High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications |
| title_full | High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications |
| title_fullStr | High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications |
| title_full_unstemmed | High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications |
| title_short | High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications |
| title_sort | high temperature epitaxial growth of tantalum nitride thin films on mgo structural evolution and potential for squid applications |
| topic | epitaxial growth squid structural evolution superconductivity tan thin films |
| url | https://doi.org/10.3762/bjnano.16.53 |
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