High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications

The growth of superconducting tantalum nitride (TaN) thin films on magnesium oxide (MgO) substrates has been studied using pulsed laser deposition (PLD). This research investigates the influence of varying deposition parameters, including substrate temperature and ambient gas composition, on the str...

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Main Authors: Michelle Cedillo Rosillo, Oscar Contreras López, Jesús Antonio Díaz, Agustín Conde Gallardo, Harvi A. Castillo Cuero
Format: Article
Language:English
Published: Beilstein-Institut 2025-05-01
Series:Beilstein Journal of Nanotechnology
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Online Access:https://doi.org/10.3762/bjnano.16.53
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author Michelle Cedillo Rosillo
Oscar Contreras López
Jesús Antonio Díaz
Agustín Conde Gallardo
Harvi A. Castillo Cuero
author_facet Michelle Cedillo Rosillo
Oscar Contreras López
Jesús Antonio Díaz
Agustín Conde Gallardo
Harvi A. Castillo Cuero
author_sort Michelle Cedillo Rosillo
collection DOAJ
description The growth of superconducting tantalum nitride (TaN) thin films on magnesium oxide (MgO) substrates has been studied using pulsed laser deposition (PLD). This research investigates the influence of varying deposition parameters, including substrate temperature and ambient gas composition, on the structural, morphological, and superconducting properties of the films. X-ray photoelectron spectroscopy, X-ray diffraction, atomic force microscopy, and transmission electron microscopy analyses revealed that the TaN films exhibit excellent crystallinity and smooth surface morphology, when deposited at optimal temperatures of 750 and 850 °C. The films exhibit superconducting transition temperatures (Tc) ranging from 5.0 to 6.3 K, depending on the stoichiometry and deposition conditions. Resistance–temperature curves further confirm the high quality of the films, as evidenced by their low residual resistivity ratios. These findings demonstrate that PLD is a suitable technique for producing high-quality TaN superconducting films.
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publisher Beilstein-Institut
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series Beilstein Journal of Nanotechnology
spelling doaj-art-a0a90d5aa5ca4deaac0bfee83bc017fe2025-08-20T03:19:24ZengBeilstein-InstitutBeilstein Journal of Nanotechnology2190-42862025-05-0116169069910.3762/bjnano.16.532190-4286-16-53High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applicationsMichelle Cedillo Rosillo0Oscar Contreras López1Jesús Antonio Díaz2Agustín Conde Gallardo3Harvi A. Castillo Cuero4Centro de Nanociencias y Nanotecnología, Universidad Nacional Autónoma de México (UNAM) km. 107 Carretera Tijuana-Ensenada, Ensenada, Baja California 22800, México Centro de Nanociencias y Nanotecnología, Universidad Nacional Autónoma de México (UNAM) km. 107 Carretera Tijuana-Ensenada, Ensenada, Baja California 22800, México Centro de Nanociencias y Nanotecnología, Universidad Nacional Autónoma de México (UNAM) km. 107 Carretera Tijuana-Ensenada, Ensenada, Baja California 22800, México Departamento de Física, Centro de Investigación y de Estudios Avanzados del Instituto Politécnico Nacional (CINVESTAV-IPN), Apdo. Postal 14-740, México D.F. 07360, México Centro de Nanociencias y Nanotecnología, Universidad Nacional Autónoma de México (UNAM) km. 107 Carretera Tijuana-Ensenada, Ensenada, Baja California 22800, México The growth of superconducting tantalum nitride (TaN) thin films on magnesium oxide (MgO) substrates has been studied using pulsed laser deposition (PLD). This research investigates the influence of varying deposition parameters, including substrate temperature and ambient gas composition, on the structural, morphological, and superconducting properties of the films. X-ray photoelectron spectroscopy, X-ray diffraction, atomic force microscopy, and transmission electron microscopy analyses revealed that the TaN films exhibit excellent crystallinity and smooth surface morphology, when deposited at optimal temperatures of 750 and 850 °C. The films exhibit superconducting transition temperatures (Tc) ranging from 5.0 to 6.3 K, depending on the stoichiometry and deposition conditions. Resistance–temperature curves further confirm the high quality of the films, as evidenced by their low residual resistivity ratios. These findings demonstrate that PLD is a suitable technique for producing high-quality TaN superconducting films.https://doi.org/10.3762/bjnano.16.53epitaxial growthsquidstructural evolutionsuperconductivitytan thin films
spellingShingle Michelle Cedillo Rosillo
Oscar Contreras López
Jesús Antonio Díaz
Agustín Conde Gallardo
Harvi A. Castillo Cuero
High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications
Beilstein Journal of Nanotechnology
epitaxial growth
squid
structural evolution
superconductivity
tan thin films
title High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications
title_full High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications
title_fullStr High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications
title_full_unstemmed High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications
title_short High-temperature epitaxial growth of tantalum nitride thin films on MgO: structural evolution and potential for SQUID applications
title_sort high temperature epitaxial growth of tantalum nitride thin films on mgo structural evolution and potential for squid applications
topic epitaxial growth
squid
structural evolution
superconductivity
tan thin films
url https://doi.org/10.3762/bjnano.16.53
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