Development of High-FOM SiC PiN Diodes

Based on Silvaco simulations, it obtained an optimized structure design of 3 300 V SiC PiN diode and developed SiC etching process and ohmic contact process. SiC PiN diode with 48 ° slant angle of bevel mesa structure and 10-5 Ω·cm2 contact resistivity of metal/4H-SiC ohmic contact was fabricated. B...

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Bibliographic Details
Main Authors: WU Jia, WANG Yiyu, YANG Cheng, SHI Jingjing
Format: Article
Language:zho
Published: Editorial Office of Control and Information Technology 2016-01-01
Series:Kongzhi Yu Xinxi Jishu
Subjects:
Online Access:http://ctet.csrzic.com/thesisDetails#10.13889/j.issn.2095-3631.2016.05.011
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