Characteristics and Photocatalytic Properties of TiO2 Thin Film Prepared by Sputter Deposition and Post-N+ Ion Implantation
TiO2 thin films of a rutile, an anatase, and a mixture type with anatase and rutile were fabricated by a magnetron sputtering method. The fabricated films were irradiated by N+ ions with several doses using the Freeman ion source. Atomic force microscopy (AFM), X-ray diffraction (XRD), X-ray photoel...
Saved in:
| Main Authors: | , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Wiley
2012-01-01
|
| Series: | Advances in Materials Science and Engineering |
| Online Access: | http://dx.doi.org/10.1155/2012/923769 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|