Numerical modeling and analysis of plasmonic flying head for rotary near-field lithography technology
Abstract Rotary near-field lithography (RNFL) technology provides a route to overcome the diffraction limit with a high throughput and low cost for nanomanufacturing. Utilizing the advantage of the passive flying of a plasmonic head, RNFL can achieve a 10 m/s processing speed with a perfect near-fie...
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| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Tsinghua University Press
2017-12-01
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| Series: | Friction |
| Subjects: | |
| Online Access: | http://link.springer.com/article/10.1007/s40544-017-0189-z |
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