Numerical modeling and analysis of plasmonic flying head for rotary near-field lithography technology

Numerical modeling and analysis of plasmonic flying head for rotary near-field lithography technology

Abstract Rotary near-field lithography (RNFL) technology provides a route to overcome the diffraction limit with a high throughput and low cost for nanomanufacturing. Utilizing the advantage of the passive flying of a plasmonic head, RNFL can achieve a 10 m/s processing speed with a perfect near-fie...

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Bibliographic Details
Main Authors: Yueqiang Hu, Yonggang Meng
Format: Article
Language:English
Published: Tsinghua University Press 2017-12-01
Series:Friction
Subjects:
rotary near-field lithography (RNFL)
coupled analysis
air bearing
finite element method
Online Access:http://link.springer.com/article/10.1007/s40544-017-0189-z
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http://link.springer.com/article/10.1007/s40544-017-0189-z

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