Low-temperature thermal atomic layer deposition of beryllium oxide films using discrete feeding methods

Low-temperature thermal atomic layer deposition of beryllium oxide films using discrete feeding methods

We demonstrate a new approach for Beryllium Oxide (BeO) film deposition using a discrete feeding method (DFM) to achieve low-temperature thermal atomic layer deposition (ThALD). Typically, BeO film deposition using ThALD at low temperatures leads to a low density and high carbon impurities, which de...

Full description

Saved in:
Bibliographic Details
Main Authors: Juyoung Chae, Jonghyun Bae, Yoonseo Jang, Dohwan Jung, Sangoh Han, Prakash R. Sultane, Christopher W. Bielawski, Jungwoo Oh
Format: Article
Language:English
Published: Elsevier 2025-06-01
Series:Applied Surface Science Advances
Subjects:
Beryllium oxide
Thermal atomic layer deposition
Discrete feeding method
Low-temperature process
Online Access:http://www.sciencedirect.com/science/article/pii/S2666523925000480
Tags: Add Tag
No Tags, Be the first to tag this record!

Internet

http://www.sciencedirect.com/science/article/pii/S2666523925000480

Similar Items