Effect of Pressure and Temperature on Preparing PZT Films

Ferroelectrics lead zirconate titanate (PZT) thin films were fabricated by pulsed laser deposition on Pt coated Si substrate. The effect of oxygen partial pressure, substrate temperature and time of ablation on the film orientation and composition will be presented. It was found that highly (111) te...

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Bibliographic Details
Main Author: Sharif Musameh
Format: Article
Language:English
Published: An-Najah National University 2002-01-01
Series:مجلة جامعة النجاح للأبحاث العلوم الطبيعية
Online Access:https://journals.najah.edu/media/journals/full_texts/effect-pressure-and-temperature-preparing-pzt-films.pdf
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Summary:Ferroelectrics lead zirconate titanate (PZT) thin films were fabricated by pulsed laser deposition on Pt coated Si substrate. The effect of oxygen partial pressure, substrate temperature and time of ablation on the film orientation and composition will be presented. It was found that highly (111) textured PZT films could be grown with careful selection of ablation conditions which are: the oxygen pressure is 300 mT, substrate temperature is 605 C and the ablation time is 16 minutes.
ISSN:1727-2114
2311-8865