First-principles study of novel triple-gate field-effect transistors based on 2D TMDs

With the increase of integration, the smaller the scale of FETs, the performance of silicon-based FETs will be limited, and two-dimensional FETs will become inevitable. In this paper, the transfer characteristics and performances of 5.1 nm, 6.1 nm 1 T/2H/1 T MoTe2 and WSe2 single-layer dual-gate Sch...

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Bibliographic Details
Main Authors: Jiajian He, Wei Mei, Lianghua Hu, Likai Ou, Yaoyang Lian, Mingan Chen, Liuming Dou
Format: Article
Language:English
Published: Elsevier 2025-01-01
Series:Next Materials
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2949822824002004
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