Photoluminescence Properties of PECVD Si-C-N Films
Hard amorphous Si-C-N films with extremely low roughness were deposited on the silicon substrates by plasma enhanced chemical vapor deposition (PECVD) using hexamethyldisilazane (HMDS), hydrogen and nitrogen as the precursors mixture. It was investigated the photoluminescence and optical spectra of...
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| Main Authors: | , , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Sumy State University
2017-04-01
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| Series: | Журнал нано- та електронної фізики |
| Subjects: | |
| Online Access: | http://jnep.sumdu.edu.ua/download/numbers/2017/2/articles/jnep_V9_02022.pdf |
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