Formation of shallow-acceptor defects in Li-irradiated N-type silicon
Point-defect-based n -type doping has been applied in power devices, whereas shallow-acceptor defects has remained unexplored in Si. We demonstrate a shallow-acceptor defect formation in Si by means of lithium-ion irradiation and thermal annealing. Comparative studies with hydrogen, helium and lithi...
Saved in:
Main Authors: | Akira Kiyoi, Naoyuki Kawabata |
---|---|
Format: | Article |
Language: | English |
Published: |
IOP Publishing
2025-01-01
|
Series: | Applied Physics Express |
Subjects: | |
Online Access: | https://doi.org/10.35848/1882-0786/ada7c1 |
Tags: |
Add Tag
No Tags, Be the first to tag this record!
|
Similar Items
-
Preparation of a Silicon/MXene Composite Electrode by a High-Pressure Forming Method and Its Application in Li<sup>+</sup>-Ion Storage
by: Yonghao Liu, et al.
Published: (2025-01-01) -
Understanding the Effect of Grown-in Defects in Silicon on Solar Cell Efficiency
by: Jinta Mathew, et al.
Published: (2025-01-01) -
CALCULATION OF STATIC PARAMETERS OF SILICON DIODE CONTAINING δ-LAYER OF TRIPLE-CHARGED POINT DEFECTS IN SYMMETRIC p–n-JUNCTION
by: N. A. Poklonski, et al.
Published: (2018-06-01) -
First-Principles Calculation and Analysis of the Magnetic and Mechanical Properties of Mo<sub>2</sub>C with Vacancy Defects and Substitutional Doping
by: Xiaoliang Qing, et al.
Published: (2024-12-01) -
PSO-Aided Inverse Design of Silicon Modulator
by: Zijian Zhu, et al.
Published: (2024-01-01)