Formation of shallow-acceptor defects in Li-irradiated N-type silicon

Point-defect-based n -type doping has been applied in power devices, whereas shallow-acceptor defects has remained unexplored in Si. We demonstrate a shallow-acceptor defect formation in Si by means of lithium-ion irradiation and thermal annealing. Comparative studies with hydrogen, helium and lithi...

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Bibliographic Details
Main Authors: Akira Kiyoi, Naoyuki Kawabata
Format: Article
Language:English
Published: IOP Publishing 2025-01-01
Series:Applied Physics Express
Subjects:
Online Access:https://doi.org/10.35848/1882-0786/ada7c1
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