Reactive Chemical Vapor Deposition Method as New Approach for Obtaining Electroluminescent Thin Film Materials

The new reactive chemical vapor deposition (RCVD) method has been proposed for thin film deposition of luminescent nonvolatile lanthanide aromatic carboxylates. This method is based on metathesis reaction between the vapors of volatile lanthanide dipivaloylmethanate (Ln(dpm)3) and carboxylic acid (H...

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Bibliographic Details
Main Authors: Valentina V. Utochnikova, Oxana V. Kotova, Andrey A. Vaschenko, Leonid S. Lepnev, Alexei G. Vitukhnovsky, Natalia P. Kuzmina
Format: Article
Language:English
Published: Wiley 2012-01-01
Series:Advances in Materials Science and Engineering
Online Access:http://dx.doi.org/10.1155/2012/809028
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