Crossed Wavelet Convolution Network for Few-Shot Defect Detection of Industrial Chips

In resistive polymer humidity sensors, the quality of the resistor chips directly affects the performance. Detecting chip defects remains challenging due to the scarcity of defective samples, which limits traditional supervised-learning methods requiring abundant labeled data. While few-shot learnin...

Full description

Saved in:
Bibliographic Details
Main Authors: Zonghai Sun, Yiyu Lin, Yan Li, Zihan Lin
Format: Article
Language:English
Published: MDPI AG 2025-07-01
Series:Sensors
Subjects:
Online Access:https://www.mdpi.com/1424-8220/25/14/4377
Tags: Add Tag
No Tags, Be the first to tag this record!
Description
Summary:In resistive polymer humidity sensors, the quality of the resistor chips directly affects the performance. Detecting chip defects remains challenging due to the scarcity of defective samples, which limits traditional supervised-learning methods requiring abundant labeled data. While few-shot learning (FSL) shows promise for industrial defect detection, existing approaches struggle with mixed-scene conditions (e.g., daytime and night-version scenes). In this work, we propose a crossed wavelet convolution network (CWCN), including a dual-pipeline crossed wavelet convolution training framework (DPCWC) and a loss value calculation module named ProSL. Our method innovatively applies wavelet transform convolution and prototype learning to industrial defect detection, which effectively fuses feature information from multiple scenarios and improves the detection performance. Experiments across various few-shot tasks on chip datasets illustrate the better detection quality of CWCN, with an improvement in mAP ranging from 2.76% to 16.43% over other FSL methods. In addition, experiments on an open-source dataset NEU-DET further validate our proposed method.
ISSN:1424-8220