Controlling the wavefront aberration of a large-aperture and high-precision holographic diffraction grating
Abstract The scanning interference field exposure technique is an effective method to fabricate holographic diffraction grating with meter-level size and nano-level precision. The main problems of fabricating large-aperture and high-precision grating by this technique are the high-precision displace...
Saved in:
| Main Authors: | , , , , , , , , , , , |
|---|---|
| Format: | Article |
| Language: | English |
| Published: |
Nature Publishing Group
2025-03-01
|
| Series: | Light: Science & Applications |
| Online Access: | https://doi.org/10.1038/s41377-025-01785-2 |
| Tags: |
Add Tag
No Tags, Be the first to tag this record!
|