Temperature‐Dependent Properties of Atomic Layer Deposition‐Grown TiO2 Thin Films
Abstract This study investigates the presence of titanium oxynitride bonds in titanium dioxide (TiO2) thin films grown by atomic layer deposition (ALD) using tetrakis dimethyl amino titanium (TDMAT) and water at temperatures between 150 and 350 °C and its effect on the films’ optical and electrical...
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| Main Authors: | , |
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| Format: | Article |
| Language: | English |
| Published: |
Wiley-VCH
2025-07-01
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| Series: | Advanced Materials Interfaces |
| Subjects: | |
| Online Access: | https://doi.org/10.1002/admi.202400855 |
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