A universal high-resolution micro-patterning technique for solution-processed materials
A universal method of micro-patterning thin quantum dot films is highly desired by industry to enable the integration of quantum dot materials with optoelectronic devices. Many of the methods reported so far, including specially engineered photoresist or ink-jet printing, are either of poor yield, r...
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Light Publishing Group
2025-08-01
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| Series: | Light: Advanced Manufacturing |
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| Online Access: | https://www.light-am.com/article/doi/10.37188/lam.2025.015 |
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| author | John Leo Velpugonda Naresh Varnakavi Matthew Yerich Lih Y Lin |
| author_facet | John Leo Velpugonda Naresh Varnakavi Matthew Yerich Lih Y Lin |
| author_sort | John Leo Velpugonda |
| collection | DOAJ |
| description | A universal method of micro-patterning thin quantum dot films is highly desired by industry to enable the integration of quantum dot materials with optoelectronic devices. Many of the methods reported so far, including specially engineered photoresist or ink-jet printing, are either of poor yield, resolution limited, difficult to scale for mass production, overly expensive, or sacrificing some optical quality of the quantum dots. In our previous work, we presented a dry photolithographic lift-off method for pixelization of solution-processed materials and demonstrated its application in patterning perovskite quantum dot pixels, 10 µm in diameter, to construct a static micro-display. This report presents further development of this method and demonstrates high-resolution patterning (~1 µm diameter), full-scale processing on a 100 mm wafer, and multi-color integration of two different varieties of quantum dots. Perovskite and cadmium-selenide quantum dots were adopted for the experimentation, but the method can be applied to other types of solution-processed materials. We also demonstrate the viability of this method for constructing high-resolution micro-arrays of quantum dot color-convertors by fabricating patterned films directly on top of a blue gallium-nitride LED substrate. The green perovskite quantum dots used for fabrication were synthesized via the room-temperature ligand-assisted reprecipitation method developed by our research group, yielding a photoluminescent quantum yield of 93.6% and full-width half-maximum emission linewidth less than 20 nm. Our results demonstrate the viability of this method for use in scalable manufacturing of high-resolution micro-displays paving the way for improved optoelectronic applications. |
| format | Article |
| id | doaj-art-7acf116090a24135be3cd6a8b579d655 |
| institution | Kabale University |
| issn | 2689-9620 |
| language | English |
| publishDate | 2025-08-01 |
| publisher | Light Publishing Group |
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| series | Light: Advanced Manufacturing |
| spelling | doaj-art-7acf116090a24135be3cd6a8b579d6552025-08-20T04:00:43ZengLight Publishing GroupLight: Advanced Manufacturing2689-96202025-08-016222823510.37188/lam.2025.015A universal high-resolution micro-patterning technique for solution-processed materialsJohn Leo Velpugondahttps://orcid.org/0000-0003-2481-5645Naresh VarnakaviMatthew YerichLih Y LinA universal method of micro-patterning thin quantum dot films is highly desired by industry to enable the integration of quantum dot materials with optoelectronic devices. Many of the methods reported so far, including specially engineered photoresist or ink-jet printing, are either of poor yield, resolution limited, difficult to scale for mass production, overly expensive, or sacrificing some optical quality of the quantum dots. In our previous work, we presented a dry photolithographic lift-off method for pixelization of solution-processed materials and demonstrated its application in patterning perovskite quantum dot pixels, 10 µm in diameter, to construct a static micro-display. This report presents further development of this method and demonstrates high-resolution patterning (~1 µm diameter), full-scale processing on a 100 mm wafer, and multi-color integration of two different varieties of quantum dots. Perovskite and cadmium-selenide quantum dots were adopted for the experimentation, but the method can be applied to other types of solution-processed materials. We also demonstrate the viability of this method for constructing high-resolution micro-arrays of quantum dot color-convertors by fabricating patterned films directly on top of a blue gallium-nitride LED substrate. The green perovskite quantum dots used for fabrication were synthesized via the room-temperature ligand-assisted reprecipitation method developed by our research group, yielding a photoluminescent quantum yield of 93.6% and full-width half-maximum emission linewidth less than 20 nm. Our results demonstrate the viability of this method for use in scalable manufacturing of high-resolution micro-displays paving the way for improved optoelectronic applications.https://www.light-am.com/article/doi/10.37188/lam.2025.015quantum dotsphotolithographyhigh-resolution patterningwafer-scale processingmulti-color patterningcolor convertersmicro-leds |
| spellingShingle | John Leo Velpugonda Naresh Varnakavi Matthew Yerich Lih Y Lin A universal high-resolution micro-patterning technique for solution-processed materials Light: Advanced Manufacturing quantum dots photolithography high-resolution patterning wafer-scale processing multi-color patterning color converters micro-leds |
| title | A universal high-resolution micro-patterning technique for solution-processed materials |
| title_full | A universal high-resolution micro-patterning technique for solution-processed materials |
| title_fullStr | A universal high-resolution micro-patterning technique for solution-processed materials |
| title_full_unstemmed | A universal high-resolution micro-patterning technique for solution-processed materials |
| title_short | A universal high-resolution micro-patterning technique for solution-processed materials |
| title_sort | universal high resolution micro patterning technique for solution processed materials |
| topic | quantum dots photolithography high-resolution patterning wafer-scale processing multi-color patterning color converters micro-leds |
| url | https://www.light-am.com/article/doi/10.37188/lam.2025.015 |
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