A universal high-resolution micro-patterning technique for solution-processed materials
A universal method of micro-patterning thin quantum dot films is highly desired by industry to enable the integration of quantum dot materials with optoelectronic devices. Many of the methods reported so far, including specially engineered photoresist or ink-jet printing, are either of poor yield, r...
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| Main Authors: | , , , |
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| Format: | Article |
| Language: | English |
| Published: |
Light Publishing Group
2025-08-01
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| Series: | Light: Advanced Manufacturing |
| Subjects: | |
| Online Access: | https://www.light-am.com/article/doi/10.37188/lam.2025.015 |
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